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| Chemical bath deposition ： ウィキペディア英語版 |
Chemical bath deposition
Chemical bath deposition (CBD) is a method to deposit thin films and nanomaterials; it can be employed for large-area batch processing or continuous deposition. In 1933 Bruckman deposited lead(II) sulfide (PbS) thin film by chemical bath deposition (CBD) or solution grown method.〔Chemical Bath Bruckman〕
==Advantages and disadvantages==
The major advantage of CBD is that it requires in its simplest form only solution containers and substrate mounting devices. One of the drawbacks of this method is the wastage of solution after every deposition. Chemical bath deposition yields stable, adherent, uniform and hard films with good reproducibility by a relatively simple process. The growth of thin films strongly depends on growth conditions, such as duration of deposition, composition and temperature of the solution, and topographical and chemical nature of the substrate.
抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』
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